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- W2024576728 abstract "Despite the fact that non-uniformity of argon ion etching, particularly with static guns is a possible source of loss of resolution of interfaces in XPS depth profiles, few measurements of etch rate uniformity have been made. In the investigation described here, therefore, a back-scattered electron imaging method was developed and used to determine the shape of a crater formed by argon etching a vacuum deposited gold film, on an aluminum substrate, using a Vacuum Generators AG2 gun. From the crater shape, the influence of etch rate variation of XPS depth profiles was assessed." @default.
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- W2024576728 date "1986-02-01" @default.
- W2024576728 modified "2023-09-25" @default.
- W2024576728 title "An analysis of the crater formed on a surface by argon ion bombardment" @default.
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- W2024576728 doi "https://doi.org/10.1016/0169-4332(86)90036-x" @default.
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