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• W2024673457 abstract "Thermal electron attachment to NO2 in He, Ar, and N2 as buffer gases has been studied at various temperatures between 257 and 354 K with the pressure range of a few to 900 Torr. At buffer‐gas pressures from a few to several tens Torr, the effective two‐body attachment rate constant (keff) initially increases and then shows a saturation at all temperatures for three buffer gases. Further increase of the pressure up to near 1 atm gives a gradual increase of keff for Ar and N2 systems, whereas no such an increase is seen for He at three different temperatures. These behaviors are explained by a mechanism of a combination of the two‐step three‐body attachment and the attachment to van der Waals molecules containing NO2. A simulation analysis supports this explanation. A remarkable finding is that in all systems studied keff’s become larger at lower temperatures. An Arrhenius plot for the initial two‐body attachment rate constant gives an activation energy of −0.17 eV. It has been suggested that an excited triplet state of NO−2 ion may be the species formed by the initial electron attachment." @default.
• W2024673457 created "2016-06-24" @default.
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• W2024673457 date "1986-10-15" @default.
• W2024673457 modified "2023-10-18" @default.
• W2024673457 title "Temperature dependence of electron attachment to NO₂" @default.
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• W2024673457 doi "https://doi.org/10.1063/1.451768" @default.
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