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- W2024766043 abstract "Surface reflection Raman scattering has been used to detect the presence of elemental arsenic in native oxide films grown on epitaxial (100) AlxGa1−xAs layers. Oxide films formed either by direct thermal oxidation in air at 450 °C or by electrochemical anodization followed by thermal aging (450 °C, in vacuo) were both found to contain elemental arsenic. Anodic films which were not subjected to a heat treatment showed no evidence for elemental arsenic inclusions within the detection limits of the technique. These observations are consistent with the occurrence of a thermally induced interfacial reaction involving As2O3 in the anodic film and the substrate." @default.
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- W2024766043 date "1981-07-01" @default.
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- W2024766043 title "Elemental arsenic in native oxide films on Al<sub><i>x</i></sub>Ga<sub>1−<i>x</i></sub>As" @default.
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- W2024766043 doi "https://doi.org/10.1063/1.92560" @default.
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