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• W2024894904 abstract "Surface diffusion is responsible for transport of atoms at the surface. It is therefore essential for understanding many surface phenomena where transport of atoms and molecules are involved. Using the field ion microscope and scanning tunneling microscope, we have directly observed many elementary surface atomic and molecular processes at terraces and steps and have measured the activation barrier heights of these processes, and have also studied their atomic mechanisms in detail. For Si(111) surface, transport of atoms above 450°C appears to be achieved by magic clusters of about 10–15 atoms in size, and their diffusion behavior is very different from those of individual atoms and molecules. We discuss how atom dynamics affects the growth behavior, island shape transitions, and growth modes in the growth of crystals and epitaxial films." @default.
• W2024894904 created "2016-06-24" @default.
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• W2024894904 date "2000-06-01" @default.
• W2024894904 modified "2023-10-11" @default.
• W2024894904 title "Atomic, molecular and cluster dynamics on flat and stepped surfaces" @default.
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• W2024894904 doi "https://doi.org/10.1016/s0079-6816(00)00017-4" @default.
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