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- W2024989117 abstract "The role of a Cu buffer layer on the formation of iron silicide nanostructures is investigated using scanning tunneling microscopy and Mössbauer spectroscopy. The deposition of 1Å Fe on the Si(111)-7×7 and the Si(111)-5×5-Cu surfaces results in the self-organization of nanoscale islands. Increasing the deposition temperature (300-600°C) leads to an exponential decrease in island density and to an increase of the average island size. At 475°C, the preferential nucleation site changes from the terrace to the step edges, i.e., step flow growth is observed. The self-assembled nanostructures exhibit the metastable CsCl–FeSi1+x structure. Due to the enhanced diffusion, nanodots formed on the 5×5 surface are significantly larger and more separated compared to growth on the bare 7×7 surface. These results show that a buffer layer provides an additional, experimentally controllable parameter, besides temperature, to tailor the size and distribution of nanodots." @default.
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- W2024989117 date "2008-01-28" @default.
- W2024989117 modified "2023-10-17" @default.
- W2024989117 title "The influence of a Cu buffer layer on the self-assembly of iron silicide nanostructures on Si(111)" @default.
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- W2024989117 doi "https://doi.org/10.1063/1.2838737" @default.
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