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- W2025101928 abstract "We present a nanometric scale analysis of the NiTi/Si, NiTi/SiO2 and NiTi/Si3N4 systems before and after annealing at 500 °C during 30 min, by secondary ion mass spectrometry and electron-induced X-ray emission spectroscopy. Before annealing, a few nanometers thick transition layer forms at the interface of each system. Under annealing, a NiSi2 layer forms in the NiTi/Si system over several tens of nanometers, whereas a TiOx diffusion barrier builds up at the NiTi/SiO2 interface. A few nanometers thick mix layer composed of TiSi2, TiN and NiSi2 forms at the NiTi/Si3N4 interface. This interface presents an intermediate reactivity under annealing between that of NiTi/Si and NiTi/SiO2." @default.
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- W2025101928 date "2004-06-01" @default.
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- W2025101928 title "Diffusion processes in NiTi/Si, NiTi/SiO2 and NiTi/Si3N4 systems under annealing" @default.
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- W2025101928 doi "https://doi.org/10.1016/j.tsf.2003.12.039" @default.
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