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- W2025115967 abstract "Ion beam lithography was studied as an alternative approach for micro/nano machining of polymeric substrates. Our preliminary study was carried out using poly(methyl methacrylate) (PMMA) as a model system. Spin cast PMMA films were submitted to masked Ca+ ion implantation (85 keV, 1 × 1014 ions/cm2), and P+ ion implantations (85 keV, 1 × 1015 and 1 × 1016 ions/cm2 respectively). The patterns generated on the films were characterized by AFM as arrays of holes with nanoscale depth and microscale width. The effect of ion implantation on surface property was investigated by measuring surface hydrophobicity. The results showed that masked ion beam lithography can change not only the surface topography, but also the surface hydrophobicity." @default.
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- W2025115967 date "2003-01-01" @default.
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- W2025115967 title "Micro/nano machining of polymeric substrates by ion beam techniques" @default.
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- W2025115967 doi "https://doi.org/10.1016/s0167-9317(02)00847-x" @default.
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