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- W2025154614 abstract "Junctions composed of La0.9Ca0.1MnO3 film and 1 wt% Nb-doped SrTiO3 substrate were fabricated using pulsed-laser deposition technique. Several junctions were annealed in O2 flow at 900 °C for 10 hours. Studies on the current-voltage characteristics of these junctions showed that the annealed junctions exhibit strong backward diode behavior that takes place for small bias (within ±1.05 V) and gradually vanishes with increasing temperature up to 50 K. As a comparison, no backward diode behavior was observed in the unannealed junctions. The depression of leakage current is believed to be responsible for the backward diode behavior in the present junctions." @default.
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- W2025154614 date "2009-09-01" @default.
- W2025154614 modified "2023-09-23" @default.
- W2025154614 title "Backward diode behavior in oxygen-excessive manganite-titanate p-n junction" @default.
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- W2025154614 doi "https://doi.org/10.1209/0295-5075/87/57006" @default.
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