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• W2025792462 abstract "The structure of thin films composed of a multilayer of PbTe nanocrystals embedded in SiO 2 , named as PbTe(SiO 2 ), between homogeneous layers of amorphous SiO 2 deposited on a single-crystal Si(111) substrate was studied by grazing-incidence small-angle X-ray scattering (GISAXS) as a function of PbTe content. PbTe(SiO 2 )/SiO 2 multilayers were produced by alternately applying plasma-enhanced chemical vapour deposition and pulsed laser deposition techniques. From the analysis of the experimental GISAXS patterns, the average radius and radius dispersion of PbTe nanocrystals were determined. With increasing deposition dose the size of the PbTe nanocrystals progressively increases while their number density decreases. Analysis of the GISAXS intensity profiles along the normal to the sample surface allowed the determination of the period parameter of the layers and a structure parameter that characterizes the disorder in the distances between PbTe layers." @default.
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• W2025792462 date "2010-03-26" @default.
• W2025792462 modified "2023-10-01" @default.
• W2025792462 title "Structure of PbTe(SiO₂)/SiO₂multilayers deposited on Si(111)" @default.
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• W2025792462 doi "https://doi.org/10.1107/s0021889810005625" @default.
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