FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2026156941> ?p ?o ?g. }

• W2026156941 endingPage "163" @default.
• W2026156941 startingPage "155" @default.
• W2026156941 abstract "Abstract Scaling of complementary metal oxide semiconductor devices is critical to enhancing performance and reducing the production cost of transistors. Conventional gate stack film systems consisting of a SiO 2 dielectric layer between the Si substrate channel and a doped polycrystalline silicon (poly-Si) gate electrode exhibited excessively high gate current leakage when the physical thickness of this traditional dielectric was scaled to T phys = ∼2 nm. The rate of scaling was initially preserved by incorporating nitrogen to form an SiO x N y insulator layer; however, this material soon experienced unacceptable levels of direct tunneling leakage current, which launched an industry-wide investigation of potential high dielectric constant (high-k) metal oxides as replacement materials for the SiO 2 based gate dielectric layer. Thermal stability requirements for the introduction of high-k dielectric materials necessitated the simultaneous replacement of poly-Si with a metal gate electrode due to several performance factors including unscalable threshold voltage. Although high-k/metal gate thermal stability has been demonstrated, significant challenges remain to be resolved for future technology nodes. This paper reviews the progress and challenges associated with the introduction of high-k/metal gate transistors, including threshold voltage tuning and gate dielectric thickness scaling, from a materials and process integration perspective." @default.
• W2026156941 created "2016-06-24" @default.
• W2026156941 creator A5030704805 @default.
• W2026156941 creator A5033103956 @default.
• W2026156941 creator A5040893372 @default.
• W2026156941 creator A5048224457 @default.
• W2026156941 creator A5058693888 @default.
• W2026156941 creator A5068291316 @default.
• W2026156941 creator A5068756876 @default.
• W2026156941 creator A5070921981 @default.
• W2026156941 creator A5087237028 @default.
• W2026156941 date "2010-02-01" @default.
• W2026156941 modified "2023-09-26" @default.
• W2026156941 title "Advanced high-k/metal gate stack progress and challenges – a materials and process integration perspective" @default.
• W2026156941 cites W1646998796 @default.
• W2026156941 cites W1973221791 @default.
• W2026156941 cites W1985328103 @default.
• W2026156941 cites W1996992035 @default.
• W2026156941 cites W2019104363 @default.
• W2026156941 cites W2022516688 @default.
• W2026156941 cites W2043441124 @default.
• W2026156941 cites W2065270104 @default.
• W2026156941 cites W2069657964 @default.
• W2026156941 cites W2080254265 @default.
• W2026156941 cites W2100974559 @default.
• W2026156941 cites W2102706597 @default.
• W2026156941 cites W2148030294 @default.
• W2026156941 cites W2149462507 @default.
• W2026156941 cites W2149806877 @default.
• W2026156941 cites W2155066043 @default.
• W2026156941 cites W2166896191 @default.
• W2026156941 cites W2171758925 @default.
• W2026156941 cites W30667999 @default.
• W2026156941 cites W4241383922 @default.
• W2026156941 doi "https://doi.org/10.3139/146.110262" @default.
• W2026156941 hasPublicationYear "2010" @default.
• W2026156941 type Work @default.
• W2026156941 sameAs 2026156941 @default.
• W2026156941 citedByCount "2" @default.
• W2026156941 countsByYear W20261569412013 @default.
• W2026156941 crossrefType "journal-article" @default.
• W2026156941 hasAuthorship W2026156941A5030704805 @default.
• W2026156941 hasAuthorship W2026156941A5033103956 @default.
• W2026156941 hasAuthorship W2026156941A5040893372 @default.
• W2026156941 hasAuthorship W2026156941A5048224457 @default.
• W2026156941 hasAuthorship W2026156941A5058693888 @default.
• W2026156941 hasAuthorship W2026156941A5068291316 @default.
• W2026156941 hasAuthorship W2026156941A5068756876 @default.
• W2026156941 hasAuthorship W2026156941A5070921981 @default.
• W2026156941 hasAuthorship W2026156941A5087237028 @default.
• W2026156941 hasConcept C119599485 @default.
• W2026156941 hasConcept C120398109 @default.
• W2026156941 hasConcept C127413603 @default.
• W2026156941 hasConcept C133386390 @default.
• W2026156941 hasConcept C139719470 @default.
• W2026156941 hasConcept C162324750 @default.
• W2026156941 hasConcept C16317505 @default.
• W2026156941 hasConcept C165801399 @default.
• W2026156941 hasConcept C166972891 @default.
• W2026156941 hasConcept C172385210 @default.
• W2026156941 hasConcept C192562407 @default.
• W2026156941 hasConcept C195370968 @default.
• W2026156941 hasConcept C199360897 @default.
• W2026156941 hasConcept C2361726 @default.
• W2026156941 hasConcept C2777042071 @default.
• W2026156941 hasConcept C41008148 @default.
• W2026156941 hasConcept C49040817 @default.
• W2026156941 hasConcept C51140833 @default.
• W2026156941 hasConcept C52780932 @default.
• W2026156941 hasConcept C61696701 @default.
• W2026156941 hasConcept C9395851 @default.
• W2026156941 hasConceptScore W2026156941C119599485 @default.
• W2026156941 hasConceptScore W2026156941C120398109 @default.
• W2026156941 hasConceptScore W2026156941C127413603 @default.
• W2026156941 hasConceptScore W2026156941C133386390 @default.
• W2026156941 hasConceptScore W2026156941C139719470 @default.
• W2026156941 hasConceptScore W2026156941C162324750 @default.
• W2026156941 hasConceptScore W2026156941C16317505 @default.
• W2026156941 hasConceptScore W2026156941C165801399 @default.
• W2026156941 hasConceptScore W2026156941C166972891 @default.
• W2026156941 hasConceptScore W2026156941C172385210 @default.
• W2026156941 hasConceptScore W2026156941C192562407 @default.
• W2026156941 hasConceptScore W2026156941C195370968 @default.
• W2026156941 hasConceptScore W2026156941C199360897 @default.
• W2026156941 hasConceptScore W2026156941C2361726 @default.
• W2026156941 hasConceptScore W2026156941C2777042071 @default.
• W2026156941 hasConceptScore W2026156941C41008148 @default.
• W2026156941 hasConceptScore W2026156941C49040817 @default.
• W2026156941 hasConceptScore W2026156941C51140833 @default.
• W2026156941 hasConceptScore W2026156941C52780932 @default.
• W2026156941 hasConceptScore W2026156941C61696701 @default.
• W2026156941 hasConceptScore W2026156941C9395851 @default.
• W2026156941 hasIssue "2" @default.
• W2026156941 hasLocation W20261569411 @default.
• W2026156941 hasOpenAccess W2026156941 @default.
• W2026156941 hasPrimaryLocation W20261569411 @default.
• W2026156941 hasRelatedWork W1501872004 @default.
• W2026156941 hasRelatedWork W1984137816 @default.

• next