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- W2026245923 abstract "Strong candidate lithography for the mass production of devices at the 32nm technology node and beyond is extreme ultra violet lithography (EUVL). The mask used in EUVL is a complex set of layers. The material composition and thickness of each layer should be considered explicitly in an attempt to model the deposited energy in the resist film during fabrication of mask features using electron-beam lithography. Targeting to sub-32nm technology even with the reduction by 4 of the mask features on the wafer level, lithography should consider accurate fabrication features on the mask level of the order of 50nm. Therefore, detailed simulation of the electron-beam fabrication process, as well as the resist dissolution mechanism and etching is demanding. In this work an attempt is initiated targeting in combining two simulation techniques i.e., the electron-beam simulation, with the stochastic lithography simulation, in a common simulation platform. This way it will be possible to get detailed information of the fine details of the fabricated features, taking into account the multilayer substrate of the mask, and the resist material properties. The e-beam simulation algorithm is presented and used to expose a layout. The calculated energy deposition in the resist level, initially determined considering resist material to be continuous, is used in the discrete representation of the resist. With appropriate threshold in the exposure energy, also acid diffusion could be taken into consideration. Stochastic development of the resist material, delivers line-edge roughness (LER) and critical dimension (CD) on the resist level, in terms of polymer chain architecture." @default.
- W2026245923 created "2016-06-24" @default.
- W2026245923 creator A5046482357 @default.
- W2026245923 creator A5047753564 @default.
- W2026245923 creator A5057711091 @default.
- W2026245923 creator A5071233362 @default.
- W2026245923 creator A5078451590 @default.
- W2026245923 date "2008-03-14" @default.
- W2026245923 modified "2023-09-23" @default.
- W2026245923 title "Electron-beam-patterning simulation and metrology of complex layouts on Si/Mo multilayer substrates" @default.
- W2026245923 doi "https://doi.org/10.1117/12.769392" @default.
- W2026245923 hasPublicationYear "2008" @default.
- W2026245923 type Work @default.
- W2026245923 sameAs 2026245923 @default.
- W2026245923 citedByCount "0" @default.
- W2026245923 crossrefType "proceedings-article" @default.
- W2026245923 hasAuthorship W2026245923A5046482357 @default.
- W2026245923 hasAuthorship W2026245923A5047753564 @default.
- W2026245923 hasAuthorship W2026245923A5057711091 @default.
- W2026245923 hasAuthorship W2026245923A5071233362 @default.
- W2026245923 hasAuthorship W2026245923A5078451590 @default.
- W2026245923 hasConcept C100460472 @default.
- W2026245923 hasConcept C105487726 @default.
- W2026245923 hasConcept C120665830 @default.
- W2026245923 hasConcept C121332964 @default.
- W2026245923 hasConcept C136525101 @default.
- W2026245923 hasConcept C142724271 @default.
- W2026245923 hasConcept C160671074 @default.
- W2026245923 hasConcept C162117346 @default.
- W2026245923 hasConcept C162996421 @default.
- W2026245923 hasConcept C163581340 @default.
- W2026245923 hasConcept C171250308 @default.
- W2026245923 hasConcept C177409738 @default.
- W2026245923 hasConcept C192562407 @default.
- W2026245923 hasConcept C200274948 @default.
- W2026245923 hasConcept C204223013 @default.
- W2026245923 hasConcept C204787440 @default.
- W2026245923 hasConcept C207789793 @default.
- W2026245923 hasConcept C2777441419 @default.
- W2026245923 hasConcept C2779227376 @default.
- W2026245923 hasConcept C41794268 @default.
- W2026245923 hasConcept C49040817 @default.
- W2026245923 hasConcept C53524968 @default.
- W2026245923 hasConcept C70520399 @default.
- W2026245923 hasConcept C71924100 @default.
- W2026245923 hasConcept C94263209 @default.
- W2026245923 hasConceptScore W2026245923C100460472 @default.
- W2026245923 hasConceptScore W2026245923C105487726 @default.
- W2026245923 hasConceptScore W2026245923C120665830 @default.
- W2026245923 hasConceptScore W2026245923C121332964 @default.
- W2026245923 hasConceptScore W2026245923C136525101 @default.
- W2026245923 hasConceptScore W2026245923C142724271 @default.
- W2026245923 hasConceptScore W2026245923C160671074 @default.
- W2026245923 hasConceptScore W2026245923C162117346 @default.
- W2026245923 hasConceptScore W2026245923C162996421 @default.
- W2026245923 hasConceptScore W2026245923C163581340 @default.
- W2026245923 hasConceptScore W2026245923C171250308 @default.
- W2026245923 hasConceptScore W2026245923C177409738 @default.
- W2026245923 hasConceptScore W2026245923C192562407 @default.
- W2026245923 hasConceptScore W2026245923C200274948 @default.
- W2026245923 hasConceptScore W2026245923C204223013 @default.
- W2026245923 hasConceptScore W2026245923C204787440 @default.
- W2026245923 hasConceptScore W2026245923C207789793 @default.
- W2026245923 hasConceptScore W2026245923C2777441419 @default.
- W2026245923 hasConceptScore W2026245923C2779227376 @default.
- W2026245923 hasConceptScore W2026245923C41794268 @default.
- W2026245923 hasConceptScore W2026245923C49040817 @default.
- W2026245923 hasConceptScore W2026245923C53524968 @default.
- W2026245923 hasConceptScore W2026245923C70520399 @default.
- W2026245923 hasConceptScore W2026245923C71924100 @default.
- W2026245923 hasConceptScore W2026245923C94263209 @default.
- W2026245923 hasLocation W20262459231 @default.
- W2026245923 hasOpenAccess W2026245923 @default.
- W2026245923 hasPrimaryLocation W20262459231 @default.
- W2026245923 hasRelatedWork W1973354166 @default.
- W2026245923 hasRelatedWork W1980495369 @default.
- W2026245923 hasRelatedWork W2013786980 @default.
- W2026245923 hasRelatedWork W2033284723 @default.
- W2026245923 hasRelatedWork W2082111913 @default.
- W2026245923 hasRelatedWork W2119359690 @default.
- W2026245923 hasRelatedWork W2145411830 @default.
- W2026245923 hasRelatedWork W2539387278 @default.
- W2026245923 hasRelatedWork W2805151322 @default.
- W2026245923 hasRelatedWork W2971086886 @default.
- W2026245923 isParatext "false" @default.
- W2026245923 isRetracted "false" @default.
- W2026245923 magId "2026245923" @default.
- W2026245923 workType "article" @default.