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- W2026340010 abstract "The local oxide defects observed in thin silicon dioxide films on p-type Si were studied with the electron beam induced current/tunneling current microscopy technique. Excluding pinholes, all the local defects observed are local oxide/substrate defects, i.e., local oxide defects propagated from defects in the Si substrate into the SiO2. It was observed that local oxide/substrate defects can be further differentiated into two different types by studying the transition from the true oxide electron beam induced current contrast to the tunneling current microscopy contrast." @default.
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- W2026340010 date "1995-11-06" @default.
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- W2026340010 title "Two types of local oxide/substrate defects in very thin silicon dioxide films on silicon" @default.
- W2026340010 doi "https://doi.org/10.1063/1.114807" @default.
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