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- W2026373603 abstract "Multiple-energy (30–325 keV) O+ implantation into GaN field-effect transistor structures (n∼1018 cm−3, 3000 Å thick) can produce as-implanted sheet resistances of 4×1012 Ω/□, provided care is taken to ensure compensation of the region up to the projected range of the lowest energy implant. The sheet resistance remains above 107 Ω/□ to annealing temperatures of ∼650 °C and displays an activation energy of 0.29 eV. No diffusion of the implanted oxygen was observed for anneals up to 800 °C." @default.
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- W2026373603 date "1999-09-01" @default.
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- W2026373603 title "Oxygen implant isolation of <i>n</i>-GaN field-effect transistor structures" @default.
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- W2026373603 doi "https://doi.org/10.1116/1.590864" @default.
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