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- W2026721431 abstract "Rhodium silicide (RhSi) of a specific resistivity of 120 ± 10 μω· cm was formed by the solid phase reaction of rhodium and silicon by use of rapid thermal annealing at temperatures ranging from 600 up to 900°C. Annealing at temperatures above 1000°C resulted in a drastic increase in specific resistivity and in an inhomogeneous, tarnished layer. No reaction of rhodium and silicon oxide after annealing took place. Through-metal arsenic implantation was used to mix rhodium with the silicon substrate. Without annealing after the mixing process, no silicide phase could be identified by X-ray diffraction measurements. By annealing at 800°C the silicide phase RhSi was formed." @default.
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- W2026721431 date "1991-11-01" @default.
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- W2026721431 title "Formation of rhodium silicide by rapid thermal annealing and by ion beam mixing" @default.
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- W2026721431 doi "https://doi.org/10.1016/0169-4332(91)90278-r" @default.
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