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- W2026721812 abstract "Abstract Single crystals of TiO2 rutile were implanted at 300 K with niobium ions at fluences in the range 5×1013 to 2.5×1017 ions cm−2, corresponding to a mean local concentration of 6×1018 to 3×1022 Nbcm−3, respectively. Rutherford backscattering spectroscopy (RBS) in channeling geometry and X-ray photoemission spectroscopy (XPS) have been performed to determine the Nb substitutional fraction and the Nb oxidation state as a function of fluence. The microstructural evolution has been followed by X-ray diffraction at glancing incidence. The dc conductivity measurements were performed using the four probes technique in the temperature range of 150 to 850 K. The conductivity as a function of the Nb fluence exhibits two different behaviours: (i) at low fluence, between 5×1013 and 5×1014 Nbcm−2, the conductivity increases by four orders of magnitude, (ii) while at high fluence, between 5×1015 and 2.5×1017 Nbcm−2, it varies slowly from 102 to 2×103 Ω−1cm−1. The conductivity is thermally activated and the activation energy deduced from Arrhenius plots (σ α(1/T)) depends on the local concentration of implanted niobium. It decreases from 0.12 eV (5×1014 Nbcm−2) to 0.01 eV (2.5×1017 Nbcm−2). A high oxidation state of niobium was observed at low fluences and the conductivity could be described by a polaron process. At high fluences the niobium oxidation state vanishes and then a hopping process between metallic clusters is superimposed on the polaron mechanism." @default.
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- W2026721812 date "1993-01-01" @default.
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- W2026721812 title "Electrical conductivity in niobium implanted TiO2 rutile" @default.
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- W2026721812 doi "https://doi.org/10.1016/0168-583x(93)90750-z" @default.
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