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- W2026921808 abstract "Hydrogenated microcrystalline silicon (μc-Si:H) was prepared by hot-wire chemical vapor deposition (HWCVD) combined with a r.f.-plasma at various r.f.-powers. A dramatic change in the crystallinity and the electron spin density was not observed by introducing the r.f.-plasma. The deposition rate decreased with the distance from the filament in HWCVD. The deposition rate of the sample prepared near the filament decreased with increasing r.f.-power. However, the deposition rate of the sample prepared far from the filament was almost independent of r.f.-power. The effect of the r.f.-plasma in HWCVD on the properties of μc-Si:H was discussed." @default.
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- W2026921808 date "2001-09-01" @default.
- W2026921808 modified "2023-09-26" @default.
- W2026921808 title "Effect of r.f.-plasma assistance in hot-wire CVD on properties of μc-Si:H" @default.
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- W2026921808 doi "https://doi.org/10.1016/s0040-6090(01)01271-8" @default.
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