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• W2026954674 abstract "Abstract Nowadays, as the deep gas reservoirs in Daqing are explored, the complex volcanic reservoirs have been the major reservoirs in deep natural gas exploration and production. The reserves of volcanic gas reservoirs take up 88% of the total gas reserves. However, the deep complex gas reservoirs may cause heavy pollution during the drilling completion, and some of the barriers between target zones of the wells are very thin, leading to a poor stability. Additionally, because of the complex water/gas relations in the formation, such as appearance of bottom water and water and gas sharing the same formation in some wells, the fracturing operations will induce water channeling. All these facts may cause the failure of the fracturing operations. Especially, when the fractured formation is close to the water/gas interface, the fractures will easily extend into the water layer. The existence of water in the gas wells directly leads to the reduction of production and recovery rate of the gas reservoirs, or even kills the gas reservoir in the worst cases. For these types of gas wells, acidization technology is a promising solution. It not only avoids the pollution near the wells of volcanic formation, but also chemically dissolves the fillings in the fractures and pores, improves formation seepage flow environment, increases fluid mobility, and finally optimizes the productivity. Acidization technology also has the advantages of low investment and quick payback. This paper reports the volcanic reservoir acidization technology we developed. The lab test results show that this technology solves the problems of high erosion rate of the oil strings under high temperatures (125-160 degree of Celsius). The acidization technology is applied in three wells, and the productivity of those increases profoundly." @default.
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• W2026954674 date "2012-10-22" @default.
• W2026954674 modified "2023-09-22" @default.
• W2026954674 title "Acidizing Technology in Complex Volcanic Gas Reservoirs--Case Study" @default.
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• W2026954674 doi "https://doi.org/10.2118/158410-ms" @default.
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