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- W2027148015 abstract "The authors present an improved near-field contact lithography technique that facilitates the characterization of superlens-based imaging systems. Pattern transfer is realized by discrete mask and photoresist components, in combination with water-soluble metal-dielectric superlens layers. Damage to imaging components is prevented by the inclusion of a flexible poly(dimethyl siloxane) (PDMS) layer in the photoresist stack. The AFM micrographs of near-field exposures performed using this technique show good fidelity between the mask and image patterns, which is not the case when the PDMS layer is omitted. The increased robustness and fidelity offered by this technique pave the way towards a full spatial frequency-domain characterization of optical superlenses, based entirely on experimentally measured data." @default.
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- W2027148015 date "2011-10-24" @default.
- W2027148015 modified "2023-09-27" @default.
- W2027148015 title "Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systems" @default.
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- W2027148015 doi "https://doi.org/10.1116/1.3653511" @default.
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