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• W2027160629 abstract "An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown." @default.
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• W2027160629 date "2002-01-01" @default.
• W2027160629 modified "2023-10-11" @default.
• W2027160629 title "X-ray multilayer monochromator with enhanced performance" @default.
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• W2027160629 doi "https://doi.org/10.1364/ao.41.000239" @default.
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