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- W2027206529 abstract "A method for optimizing the electron optics of the SCALPEL exposure tool is described. The method uses the SCALPEL mark detection method with a grating mark as an aerial image monitor. The root-mean-square deviation of the recorded backscattered electron signal from an ideal triangle waveform was used as a measure of the image fidelity, scale and orientation. The resolution of the technique is limited only by signal-to-noise and the fidelity of the marks. Experiments were performed using 2 μm period grating marks that were fabricated in a SiO2/WSi2 structure using SCALPEL lithography and plasma processing. The projector lenses and magnification/rotation coils were optimized. For these experiments the measured resolutions for determining focus (δf), magnification (δM), and rotation (δθ) of a 250 μm X 250 μm field were δf ∼ ±1 μm, δM ∼ ±15 ppm and δθ ∼ ± 0.1 mrad. A straightforward path to improving these results is described." @default.
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- W2027206529 date "2000-06-01" @default.
- W2027206529 modified "2023-09-26" @default.
- W2027206529 title "Marks for SCALPEL® tool optics optimization" @default.
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- W2027206529 doi "https://doi.org/10.1016/s0167-9317(00)00321-x" @default.
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