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• W2027801013 abstract "Summary form only given. In this work we investigated vertical flash memory devices with Al2O3 as control oxide with protein mediated self assembled PbSe nanocrystals used as floating gate. The introduction of high-k dielectric as control oxide provides lower voltage/faster operation and hence less power consumption compared with the devices fabricated with SiO2 as control oxide. For appropriate memory operation the dielectric permittivity, conduction/valence band offset and thickness of the high-k material have to be properly engineered. Higher permittivity ensures better capacitance and scalability; higher band offset improves retention and programming window. Al2O3 has the potential to be the high-k replacement of inter-poly oxide due to its relatively high electron and hole barrier heights and high permittivity." @default.
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• W2027801013 date "2008-06-01" @default.
• W2027801013 modified "2023-09-25" @default.
• W2027801013 title "Vertical Flash memory devices with Protein-assembled Nanocrystal floating gate and A1<inf>2</inf>O<inf>3</inf> control oxide" @default.
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• W2027801013 doi "https://doi.org/10.1109/drc.2008.4800732" @default.
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