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- W2028011818 abstract "We have studied 5.5 nm thick SiO2 films, loaded with deuterium by means of thermal treatment in a D2-rich atmosphere. Nuclear reaction analysis of the samples using the 2H(3He,p)4He reaction at 700 keV allowed the determination of the total amount of deuterium in the as-loaded samples, as well as in those submitted to thermal annealing in vacuum at different temperatures and for different times. The distribution in depth of deuterium in the SiO2 films was also accessed, using step-by-step chemical etching associated with nuclear reaction analyses to determine the total amount of deuterium and oxygen remaining in the films after each step of chemical dissolution. The film thickness is related to the total amount of oxygen, which were measured by means of the 16O(d,p)17O nuclear reaction at 810 keV. The activation energies and depth profiles determined here are discussed in terms of physico-chemical processes responsible for the incorporation of deuterium in ultrathin SiO2 films, as well as those associated with the rupture of the chemical bonds, diffusion and desorption of deuterium during vacuum annealing." @default.
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- W2028011818 date "1998-03-01" @default.
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- W2028011818 title "Nuclear reaction analysis of deuterium in ultrathin films of SiO2 on Si" @default.
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- W2028011818 doi "https://doi.org/10.1016/s0168-583x(97)00680-0" @default.
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