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- W2028490004 abstract "Plasmachemical deposition using an atomized precursor spray can yield up to a 1000-fold enhancement in film deposition rate (microns/min). Furthermore, excellent functional and structural retention is achieved, which is in marked contrast to corresponding vapour-phase-plasma deposition for comparable input plasma powers. Poly(isodecyl acrylate) layers have been prepared by atomized spray plasma deposition (ASPD) using isodecyl acrylate precursor." @default.
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- W2028490004 date "2013-07-01" @default.
- W2028490004 modified "2023-09-27" @default.
- W2028490004 title "Atomized spray plasma deposition (ASPD) of structurally well-defined alkyl functionalized layers" @default.
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- W2028490004 doi "https://doi.org/10.1016/j.surfcoat.2012.12.025" @default.
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