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- W2028543337 abstract "We investigated the effect of quencher type and loading concentration in OoB-insensitive EUV resists via actualexposure on the latest EUV scanner and stochastic simulation using Prolith. Model resist samples with two quenchertypes, conventional base type and photo-decomposable base type, at variant loading concentrations were prepared and tested. Basic indicators of lithographic performance, such as depth of focus, energy latitude, and line-width roughness were significantly improved by 80 nm, 8.4% and 25%, respectively along with a moderate increase of sensitivity (ca. 5mJ/cm2) under the optimized quencher condition. Meanwhile, we further quantitatively analysis the outgassing-induced contamination growth to realize the quencher distribution engineering effect on outgassing issue in EUV lithography. In addition, stochastic simulation for EUV resist featuring various types of quenchers provides certain correlation with the experimental results." @default.
- W2028543337 created "2016-06-24" @default.
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- W2028543337 date "2013-04-01" @default.
- W2028543337 modified "2023-09-23" @default.
- W2028543337 title "Quencher distribution engineering for out-of-band insensitive EUV resists: experiments and stochastic simulation" @default.
- W2028543337 doi "https://doi.org/10.1117/12.2010658" @default.
- W2028543337 hasPublicationYear "2013" @default.
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