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- W2028554090 abstract "The usefulness of Se-Ge inorganic photoresists as ion-implantation masks is described. Experimentally determined values of the projected range and range straggling are in agreement with theory. The required masking thickness is shown to be about ⅓ of that of organic photoresist. Other advantageous features are also pointed out." @default.
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- W2028554090 title "Properties of Se-Ge inorganic photoresist as an ion-implantation mask" @default.
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- W2028554090 doi "https://doi.org/10.1049/el:19790360" @default.
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