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• W2028563553 abstract "Passive films formed on pure Ti and crystalline and amorphous Ti-Ni alloys containing from 30 to 60 at% Ti in a sulfuric acid solution were studied by XPS and photoelectrochemical methods. The photocurrent increased with applied anodic potential. The band-gap energies in the surface films were in the range of 3.2–3.4 eV which decreased with increasing applied potential. In the surface film, Ti ions were enriched. The Ti in the film consisted of Ti4+, Ti3+ and Ti2+ ions. The ratios between them on a specimen were independent of the applied potential, although the thickness of the surface film itself increased with the increasing potential. The surface films on pure Ti and Ti-Ni alloys contained OH-type oxygen." @default.
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• W2028563553 date "1993-01-01" @default.
• W2028563553 modified "2023-10-18" @default.
• W2028563553 title "The surface characterization of titanium and titanium-nickel alloys in sulfuric acid" @default.
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• W2028563553 doi "https://doi.org/10.1016/0010-938x(93)90131-y" @default.
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