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- W2028660117 abstract "Microbridge formation in a CAMN photoresist we have developed is dependent on the ratio of dose to print (DTP) to dose to gel (DTG) as well as resist contrast. Photoresists formulated with poly(p-hydroxystyrene) (PHS) have a very high tendency to form microbridges when developed in 2.38 wt% TMAH due to high contrast and high DTP/DTG ratio. When photoresists formulated from PHS were developed in 1.2 wt% TMAH contrast and DTP/DTG ratio were reduced resulting in microbridging being nearly eliminated. Using this observation we developed an I-line CAMN photoresist with PHS type thermal stability and high resolution capabilities which can be developed in industry standard 2.38 wt% TMAH." @default.
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- W2028660117 date "1995-06-09" @default.
- W2028660117 modified "2023-10-03" @default.
- W2028660117 title "<title>Investigation into the origin of microbridging in chemically amplified negative-tone photoresists</title>" @default.
- W2028660117 doi "https://doi.org/10.1117/12.210418" @default.
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