Matches in SemOpenAlex for { <https://semopenalex.org/work/W2028667031> ?p ?o ?g. }
Showing items 1 to 80 of
80
with 100 items per page.
- W2028667031 abstract "Single level dry developable resist process based on gas phase silylation has great promise for sub-halfmicron pattern imaging due to shallow exposure, which leads to a thin silicon incorporation layer during silylation process in the top exposed region. In this paper the influence of process key parameters on the lithographic performance characterization has been investigated. For this experiment, two kinds of commercial i-line photoresists based upon novolac-diazoquinone and tetramethyldisilazane as a silylation agent were used for analyzing the process properties. As a result, it was observed that the ultimate resolution of 0.30 micrometers with vertical profiles, projected with an i-line of 0.54 NA lens, was obtained. However, it was found that CD linearity characteristics strongly depend on the compositions and the structure of photoresist, independent of other process parameters. Selectivity of dry development with a range of 13 - 15 was achieved using the oxygen/argon mixtures at 5 mTorr with MERIE. Major factors affect on the resist pattern profile were proven to be dry development parameters as well as the latent image formation of silylation. In particular, lower power and higher magnetic field conditions at low pressure allowed a good resist pattern profile without sidewall roughness and residues. And effects of silylation parameters on process latitudes has also been studied by comparing resolution capability, DOF, and exposure latitude, respectively." @default.
- W2028667031 created "2016-06-24" @default.
- W2028667031 creator A5012066024 @default.
- W2028667031 creator A5024020559 @default.
- W2028667031 creator A5032636147 @default.
- W2028667031 creator A5059606920 @default.
- W2028667031 creator A5067545942 @default.
- W2028667031 creator A5080861078 @default.
- W2028667031 creator A5081185798 @default.
- W2028667031 date "1993-09-15" @default.
- W2028667031 modified "2023-09-27" @default.
- W2028667031 title "<title>Influence of process parameters on the lithographic performance characterization in the top imaging process by silylation</title>" @default.
- W2028667031 doi "https://doi.org/10.1117/12.154804" @default.
- W2028667031 hasPublicationYear "1993" @default.
- W2028667031 type Work @default.
- W2028667031 sameAs 2028667031 @default.
- W2028667031 citedByCount "0" @default.
- W2028667031 crossrefType "proceedings-article" @default.
- W2028667031 hasAuthorship W2028667031A5012066024 @default.
- W2028667031 hasAuthorship W2028667031A5024020559 @default.
- W2028667031 hasAuthorship W2028667031A5032636147 @default.
- W2028667031 hasAuthorship W2028667031A5059606920 @default.
- W2028667031 hasAuthorship W2028667031A5067545942 @default.
- W2028667031 hasAuthorship W2028667031A5080861078 @default.
- W2028667031 hasAuthorship W2028667031A5081185798 @default.
- W2028667031 hasConcept C107365816 @default.
- W2028667031 hasConcept C113196181 @default.
- W2028667031 hasConcept C120665830 @default.
- W2028667031 hasConcept C121332964 @default.
- W2028667031 hasConcept C134406635 @default.
- W2028667031 hasConcept C159985019 @default.
- W2028667031 hasConcept C161790260 @default.
- W2028667031 hasConcept C171250308 @default.
- W2028667031 hasConcept C178790620 @default.
- W2028667031 hasConcept C185592680 @default.
- W2028667031 hasConcept C192562407 @default.
- W2028667031 hasConcept C204223013 @default.
- W2028667031 hasConcept C207789793 @default.
- W2028667031 hasConcept C2779227376 @default.
- W2028667031 hasConcept C49040817 @default.
- W2028667031 hasConcept C5304478 @default.
- W2028667031 hasConcept C53524968 @default.
- W2028667031 hasConcept C544956773 @default.
- W2028667031 hasConcept C71039073 @default.
- W2028667031 hasConceptScore W2028667031C107365816 @default.
- W2028667031 hasConceptScore W2028667031C113196181 @default.
- W2028667031 hasConceptScore W2028667031C120665830 @default.
- W2028667031 hasConceptScore W2028667031C121332964 @default.
- W2028667031 hasConceptScore W2028667031C134406635 @default.
- W2028667031 hasConceptScore W2028667031C159985019 @default.
- W2028667031 hasConceptScore W2028667031C161790260 @default.
- W2028667031 hasConceptScore W2028667031C171250308 @default.
- W2028667031 hasConceptScore W2028667031C178790620 @default.
- W2028667031 hasConceptScore W2028667031C185592680 @default.
- W2028667031 hasConceptScore W2028667031C192562407 @default.
- W2028667031 hasConceptScore W2028667031C204223013 @default.
- W2028667031 hasConceptScore W2028667031C207789793 @default.
- W2028667031 hasConceptScore W2028667031C2779227376 @default.
- W2028667031 hasConceptScore W2028667031C49040817 @default.
- W2028667031 hasConceptScore W2028667031C5304478 @default.
- W2028667031 hasConceptScore W2028667031C53524968 @default.
- W2028667031 hasConceptScore W2028667031C544956773 @default.
- W2028667031 hasConceptScore W2028667031C71039073 @default.
- W2028667031 hasLocation W20286670311 @default.
- W2028667031 hasOpenAccess W2028667031 @default.
- W2028667031 hasPrimaryLocation W20286670311 @default.
- W2028667031 hasRelatedWork W1976044969 @default.
- W2028667031 hasRelatedWork W1977121769 @default.
- W2028667031 hasRelatedWork W1984270006 @default.
- W2028667031 hasRelatedWork W1991804230 @default.
- W2028667031 hasRelatedWork W2029768208 @default.
- W2028667031 hasRelatedWork W2046671429 @default.
- W2028667031 hasRelatedWork W2056310104 @default.
- W2028667031 hasRelatedWork W2069371907 @default.
- W2028667031 hasRelatedWork W2084216123 @default.
- W2028667031 hasRelatedWork W2144942665 @default.
- W2028667031 isParatext "false" @default.
- W2028667031 isRetracted "false" @default.
- W2028667031 magId "2028667031" @default.
- W2028667031 workType "article" @default.