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• W2028761421 abstract "The nature of argon-ion bombarded nickel surfaces (polycrystalline, and (111), (110) and (100) single crystals) and their subsequent interaction with oxygen at ordinary temperatures have been studied using X-ray and UV photoelectron spectroscopy, including angular variation measurements and the determination of work function changes, in combination in the same apparatus. Variations between the HeI spectra of the four clean substrates were taken to confirm the presence of substantial order within the depth sampled by UPS. The four surfaces exhibited similar but not identical behaviour during oxidation, resembling that reported by other workers from studies of both annealed single crystals and evaporated polycrystalline films. The initial process was deduced to be essentially dissociative chemisorption: no evidence supporting a previous suggestion of associative adsorption at low coverages was found. Oxygen commenced to penetrate below the surface of all samples before oxygen equivalent to a monolayer had been taken up (~10 L exposure) and further substantial uptake followed resulting in the formation of a stable film (~18 Å) of nickel oxide by ~100 L exposure. This oxide layer was not stoichiometric nickel(II) oxide: it was characterized by the presence of two distinct O 1s signals, the relative intensities of which depended on the crystallographic nature of the surface. It is tentatively suggested that the oxygen signal with the higher BE be associated with NiIII. Comparison of the X-ray and UV spectra suggests that the oxide film is very non-uniform in thickness, some Ni metal remaining very close to the surface." @default.
• W2028761421 created "2016-06-24" @default.
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• W2028761421 date "1976-05-01" @default.
• W2028761421 modified "2023-09-27" @default.
• W2028761421 title "Oxidation of nickel studied by UV and X-ray photoelectron spectroscopy" @default.
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• W2028761421 doi "https://doi.org/10.1016/0039-6028(76)90262-4" @default.
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