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- W2028779871 abstract "Abstract Values of the transmission sputtering yield of aluminium when bombarded with 30–100 keV Ar + ions have been obtained. Also values for recoil implantation yield for Ar + on aluminium have been measured with aluminium films deposited onto pure silica and polythene. The results are compared with the sputtering theory of Sigmund 8 ) and good agreement has been achieved. Estimates of the range of recoil implanted atoms are made using electrical measurement techniques and it is concluded that the range is too small for the method to be useful for conventional semiconductor doping but great enough for surface and thin film doping." @default.
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- W2028779871 date "1972-07-01" @default.
- W2028779871 modified "2023-09-25" @default.
- W2028779871 title "Transmission sputtering and recoil implantation from thin metal films under ion bombardment" @default.
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- W2028779871 doi "https://doi.org/10.1016/0029-554x(72)90528-9" @default.
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