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- W2028860003 abstract "There have been some researches which describe that the thermal stability of the high-k dielectrics could be improved by the nitridation process (1, 2). In this study, we examine the effect of different ICP plasma nitridation to the reliability of HfO2 thinfilms (3). The hysteresis, stress induced leakage current (SILC) and constant voltage stress (CVS) characteristics of the samples were preformed to estimate the improvement effect. According to this study, the plasma nitridation process would be an effective technology to improve the reliability of pure HfO2 thin films." @default.
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- W2028860003 date "2019-12-18" @default.
- W2028860003 modified "2023-10-18" @default.
- W2028860003 title "The Improvement Effect of the Plasma Nitridation Process to the Reliability of HfO2 Thin Films" @default.
- W2028860003 doi "https://doi.org/10.1149/1.3122132" @default.
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