Matches in SemOpenAlex for { <https://semopenalex.org/work/W2029129435> ?p ?o ?g. }
Showing items 1 to 52 of
52
with 100 items per page.
- W2029129435 abstract "With KrF and off-axis illumination (OAI) technique we should set up 150nm lithography process without using phase shift mask. But isolated-dense bias (ID bias) makes 150nm lithography process difficult. We investigated ID bias trend at different OAI condition and found that it could be reduced by optimizing OAI condition. We represent OAI as quadrupole center (sigma) R and pole size radius r. With high NA, small R and small r we can reduce ID bias but cannot eliminate completely at 150nm lithography. Also we found out that ID bias of duty patterns are more severe than that of dense and isolated patterns. Using OAI at a certain space width between lines, the width of lien has its minimum. This line thinning phenomena at this weak zone depends on OAI condition such as NA, R and coherence value. We compared simulation data with experimental result and could see the same phenomena at simulation data. Therefore OPC is necessary to avoid this weak zone. By experiment and simulation with NA higher than 0.65 and Optical Proximity Correction, we could set up 150nm lithography process with below 0.20micrometers periphery pattern design rule." @default.
- W2029129435 created "2016-06-24" @default.
- W2029129435 creator A5054586884 @default.
- W2029129435 creator A5064737582 @default.
- W2029129435 creator A5075720374 @default.
- W2029129435 creator A5077958833 @default.
- W2029129435 creator A5090692369 @default.
- W2029129435 date "1999-07-26" @default.
- W2029129435 modified "2023-10-17" @default.
- W2029129435 title "Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF" @default.
- W2029129435 doi "https://doi.org/10.1117/12.354384" @default.
- W2029129435 hasPublicationYear "1999" @default.
- W2029129435 type Work @default.
- W2029129435 sameAs 2029129435 @default.
- W2029129435 citedByCount "2" @default.
- W2029129435 crossrefType "proceedings-article" @default.
- W2029129435 hasAuthorship W2029129435A5054586884 @default.
- W2029129435 hasAuthorship W2029129435A5064737582 @default.
- W2029129435 hasAuthorship W2029129435A5075720374 @default.
- W2029129435 hasAuthorship W2029129435A5077958833 @default.
- W2029129435 hasAuthorship W2029129435A5090692369 @default.
- W2029129435 hasConcept C120665830 @default.
- W2029129435 hasConcept C121332964 @default.
- W2029129435 hasConcept C192562407 @default.
- W2029129435 hasConcept C204223013 @default.
- W2029129435 hasConcept C207789793 @default.
- W2029129435 hasConcept C49040817 @default.
- W2029129435 hasConcept C78371743 @default.
- W2029129435 hasConceptScore W2029129435C120665830 @default.
- W2029129435 hasConceptScore W2029129435C121332964 @default.
- W2029129435 hasConceptScore W2029129435C192562407 @default.
- W2029129435 hasConceptScore W2029129435C204223013 @default.
- W2029129435 hasConceptScore W2029129435C207789793 @default.
- W2029129435 hasConceptScore W2029129435C49040817 @default.
- W2029129435 hasConceptScore W2029129435C78371743 @default.
- W2029129435 hasLocation W20291294351 @default.
- W2029129435 hasOpenAccess W2029129435 @default.
- W2029129435 hasPrimaryLocation W20291294351 @default.
- W2029129435 hasRelatedWork W1931823040 @default.
- W2029129435 hasRelatedWork W1965130794 @default.
- W2029129435 hasRelatedWork W1973071557 @default.
- W2029129435 hasRelatedWork W1975154580 @default.
- W2029129435 hasRelatedWork W2068691156 @default.
- W2029129435 hasRelatedWork W2079102450 @default.
- W2029129435 hasRelatedWork W2082242552 @default.
- W2029129435 hasRelatedWork W2137350949 @default.
- W2029129435 hasRelatedWork W3173419540 @default.
- W2029129435 hasRelatedWork W4281622355 @default.
- W2029129435 isParatext "false" @default.
- W2029129435 isRetracted "false" @default.
- W2029129435 magId "2029129435" @default.
- W2029129435 workType "article" @default.