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- W2029171207 abstract "Hydrogenated amorphous silicon is known for its large area imaging applications because of its high photoconductivity and high absorption coefficient in the visible light range. This material can be also applied to X-ray imaging when coupled with a uniform scintillation (e.g. Gd2O2S phosphor) film integrated on top of a 2-D detection array. A thick phosphor layer is the prerequisite for high X-ray conversion efficiency. In reality, however, there may be significant crosstalk between adjacent pixels thus undermining spatial resolution. This paper introduces a high aspect ratio microstructure with the new photoresist SU-8 epoxy, which limits the phosphor to regions above the photodiodes. The differences between the above scheme and that of a continuous phosphor layer are compared in terms of the absorption efficiency, the conversion efficiency, and the modulation transfer function (MTF). The measurements are carried out in a medical testing environment with X-ray source voltages of 40-120kVp. The results show a great improvement in the spatial resolution." @default.
- W2029171207 created "2016-06-24" @default.
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- W2029171207 date "2002-09-04" @default.
- W2029171207 modified "2023-09-27" @default.
- W2029171207 title "<title>Resolution enhancement and performance characteristics of large-area a-Si:H x-ray imager with a high-aspect-ratio SU-8 micromold</title>" @default.
- W2029171207 doi "https://doi.org/10.1117/12.481582" @default.
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