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- W2029446353 abstract "The d.c. conductivity in plasma-polymerized tetramethylsilane films was investigated using asymmetric metal/polymer/Si structures. Poole-Frenkel centers with a trap depth of 1.0 eV appear to be responsible for the observed conductivity. Comparison of these data with IR Fourier transform spectra suggests that the trapping centers may be related to Si—O and CO dipoles in the structure. The conductivity and the charge level in the films are dependent on the exposure of the films to oxygen and moisture. After moisture incorporation the films display a stronger dependence on Schottky emission than on Poole-Frenkel emission. These results are interpreted in terms of the formation of trapping centers at the Si- polymer interface." @default.
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- W2029446353 date "1981-04-01" @default.
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- W2029446353 title "Conduction mechanism in plasma-polymerized tetramethylsilane films" @default.
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- W2029446353 doi "https://doi.org/10.1016/0040-6090(81)90611-8" @default.
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