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- W2029450141 abstract "In order to make chemically vapor deposited diamond (CVDD) substrates amenable to surface metallization without significant reduction in thermal conductivity, very thin alumina films were grown on diamond by vapor deposition of Al in oxygen atmosphere, followed by very low-temperature annealing in oxygen. A Cr interlayer initially deposited on CVDD prior to alumina deposition was found to lead to excellent adhesion between the substrate and the deposit. The alumina films were characterized by scanning and transmission electron microscopy as well as Auger electron spectroscopy." @default.
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- W2029450141 date "1996-05-20" @default.
- W2029450141 modified "2023-09-27" @default.
- W2029450141 title "Surface modification of chemically vapor deposited diamond for producing adherent thick and thin film metallizations for electronic packaging" @default.
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- W2029450141 doi "https://doi.org/10.1063/1.116365" @default.
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