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- W2029453937 abstract "We evaluated the performances of Cr and amorphous Si (a-Si) films as light absorber materials for photomasks of near-field lithography on the basis of numerical studies using finite-difference time domain method and experimental results of fabrication process. With exposure experiments using both a Cr mask and an a-Si mask, fine performance of an a-Si near-field mask was demonstrated with respect to resolution. A half-pitch 32nm resist pattern of 120nm high was fabricated through the near-field lithography using the a-Si mask and a subsequent trilayer resist process." @default.
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- W2029453937 date "2006-07-17" @default.
- W2029453937 modified "2023-10-01" @default.
- W2029453937 title "Fabrication of half-pitch 32nm resist patterns using near-field lithography with a-Si mask" @default.
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- W2029453937 doi "https://doi.org/10.1063/1.2227633" @default.
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