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- W2029528704 abstract "Thin film of PrFe0.5Ni0.5O3 was synthesis by pulsed laser deposition technique on silicon wafer. The structure and phase identification of the film was carried out by X-ray diffraction and confirms orthorhombic structure with polycrystalline growth. Atomic Force Microscopy (surface morphology) shows small grain size with good smoothness for the grown film. From dielectric study, low dielectric loss and week ferroelectric nature is observed at room temperature. Various possibilities were explored to explain the observed dielectric properties with the proposed crystal structure." @default.
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- W2029528704 date "2014-06-01" @default.
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- W2029528704 title "Structural, morphological and ac conductivity study of PrFe0.5Ni0.5O3 thin film" @default.
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