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• W2029589744 abstract "Films of Fe x SiO (0< x <3) prepared by coevaporation of iron and silicon monoxide were characterized by electron spin resonance (ESR), X-ray diffractometry (XRD), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS) and electrical conductivity measurements. A ferromagnetic resonance (FMR) signal attributable to ferromagnetic iron grains was detected in as-deposited Fe x SiO ( x >0.5) films. The room-temperature electrical conductivity increases with the Fe/Si ratio steeply at x <0.5 but gently at x >0.5. The formation of a metallic iron phase in as-deposited Fe x SiO ( x >2) films and in annealed films was confirmed by XRD and TEM investigations. The critical Fe/Si ratio of 0.5 observed in ESR and conductivity measurements is associated with the granular structure growth. The granular iron growth in the as-deposited films is discussed." @default.
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• W2029589744 date "1991-10-01" @default.
• W2029589744 modified "2023-10-18" @default.
• W2029589744 title "Characterization of Fe_xSiO (0<x<3) Granular Films by Electron Spin Resonance" @default.
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• W2029589744 doi "https://doi.org/10.1143/jjap.30.2569" @default.
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