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- W2029721569 abstract "Aluminum nitride (AlN) was produced on the surface of aluminum metal by nitrogen (N2) etching at ion energies of 6–8 keV. An electrical potential bias was applied to the sample during etching to enable a study of the effect of such a bias on the formation of the AlN. The results show that AlN will form during etching, although any oxygen present will preferentially react to form the oxide. We find an unusual peak in the N 1s region, shifted 7.5 eV to higher binding energy from the main peak, when etching is performed with oxygen impurities in the nitrogen supply. It is believed that this peak arises from the implantation of N2 into oxidized aluminum. We believe that voltage biasing does not affect the products of nitrogen etching of aluminum." @default.
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- W2029721569 date "1995-05-01" @default.
- W2029721569 modified "2023-10-18" @default.
- W2029721569 title "An x-ray photoelectron spectroscopic study of voltage bias implantation and nitrogen etching of aluminum" @default.
- W2029721569 doi "https://doi.org/10.1116/1.579554" @default.
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