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• W2029777315 abstract "Tb-Co amorphous films are prime candidates for use as magneto-optical recording media, but the method commonly employed to induce a perpendicular magnetic anisotropy, bias sputtering, is not compatible with glass substrates. In this case RF sputtering is used in an H 2 -Ar gas mixture, without a substrate bias voltage, to form Tb-Co films. As the hydrogen partial pressure P H2 was increased, the film saturation magnetization M s decreased, the uniaxial anisotropy constant K u increased, and the Kerr hysteresis loop became more rectangular. For P H2 = 10 percent, samples had an extremely large positive anisotropy even when the Tb content was varied over a wide range." @default.
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• W2029777315 date "1985-08-01" @default.
• W2029777315 modified "2023-09-23" @default.
• W2029777315 title "Perpendicular Magnetic Anisotropy of Tb-Co Amorphous Films Sputtered In H2-Added Ar Gas" @default.
• W2029777315 doi "https://doi.org/10.1109/tjmj.1985.4548890" @default.
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