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• W2030021000 endingPage "345" @default.
• W2030021000 startingPage "332" @default.
• W2030021000 abstract "Patents, which are regarded as important sources of innovation, are closely related to innovation strategies, and data from patent registrations are frequently used in innovation studies. Generally, such studies collect patent information from a patent database and analyze it to identify innovation trends and strategies at the firm, industry, and national levels. Therefore, it is important not only to develop and apply a suitable analysis method, but also to select a patent database that is appropriate for such studies' research objectives. But few previous studies on patent analysis have carefully examined the suitability of the databases they have used. To help in the use of patent databases for innovation studies, this paper investigates the characteristics of four databases: the USPTO, EPO, JPO, and KIPO. For this purpose, all patents registered at each database over the three years 2008–2010 were extracted for cross-sectional analysis, and the number of annual patents registered in two patent classes, A61 and G06, during the last 20 years (1992 to 2011), was collected for longitudinal analysis. The analysis perspectives were set in the context of comparison between databases. After integrating the results of this comparison, this study summarized key features of each patent database in terms of the necessary conditions to be good knowledge sources of innovation studies. The research results are expected to contribute to a better understanding of the characteristics of various patent databases, and to further support the validity of patent analyses." @default.
• W2030021000 created "2016-06-24" @default.
• W2030021000 creator A5032544422 @default.
• W2030021000 creator A5078875866 @default.
• W2030021000 date "2015-03-01" @default.
• W2030021000 modified "2023-10-13" @default.
• W2030021000 title "Patent databases for innovation studies: A comparative analysis of USPTO, EPO, JPO and KIPO" @default.
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• W2030021000 doi "https://doi.org/10.1016/j.techfore.2015.01.009" @default.
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