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- W2030052014 abstract "We have developed a non-contact method for quantitative measurements of permittivity, k, for low-k dielectric films of 0.1 to 1.5 mum in thickness deposited on up to 300-mm silicon wafers. It is based on a near-field scanned microwave probe formed by a microfabricated 4 GHz stripline resonator tapered down to a few-micron tip size. Probe calibration and measurements are performed at a unique tip-sample distance at which the probe resonant frequency exhibits a linear dependence on the parameter (k-1)/(k+1). The probe has about 10 micron sampling spot size and provides better than 0.3% precision and plusmn2% accuracy for k-value. Excellent correlation with mercury probe measurements is established using a variety of blanket low-k films" @default.
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- W2030052014 date "2006-06-01" @default.
- W2030052014 modified "2023-09-27" @default.
- W2030052014 title "A Microfabricated Near-Field Scanned Microwave Probe for Noncontact Dielectric Constant Metrology of Low-k Films" @default.
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- W2030052014 doi "https://doi.org/10.1109/mwsym.2006.249647" @default.
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