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- W2030227480 abstract "The correlation between micro-roughness, surface chemistry, and performance of crystalline Si/amorphous Si:H:Cl hetero-junction solar cells is discussed through a deposition study of amorphous Si:H:Cl (a-Si:H:Cl) films by rf plasma-enhanced chemical vapor deposition using a SiH2Cl2–H2 mixture. The degree of H- and Cl-termination on the growing surface determined the degree of micro-roughness at the p-type a-Si:H:Cl/intrinsic a-Si:H:Cl interface and solar cell performance. A higher degree of Cl-termination compared to H-termination was effective to suppress the micro-roughness at the growing surface and oxygen incorporation into the film, as well as chemical reduction of the intrinsic a-Si:H:Cl layer during the underneath p-layer formation. The study showed that a-Si:H:Cl deposited from SiH2Cl2 is a potential material for c-Si hetero-junction solar cells with an intrinsic a-Si:H:Cl thin layer." @default.
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- W2030227480 date "2008-05-01" @default.
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- W2030227480 title "Correlation between micro-roughness, surface chemistry, and performance of crystalline Si/amorphous Si:H:Cl hetero-junction solar cells" @default.
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- W2030227480 doi "https://doi.org/10.1016/j.jnoncrysol.2007.10.065" @default.
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