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- W2030341957 startingPage "9828" @default.
- W2030341957 abstract "We report on measurements of the electrical resistance of thin nickel films deposited at room temperature (22 ifmmode^circelsetextdegreefi{}C) under a pressure of less than 2ifmmodetimeselsetexttimesfi{}${10}^{mathrm{ensuremath{-}}7}$ Torr with a deposition rate of 0.1 nm/s. The mechanisms responsible for the conduction in the film have been identified. In the thickness region 5.7ensuremath{le}densuremath{le}10.4 nm the resistance of the film is well described by (d-${d}_{c}$${)}^{mathrm{ensuremath{-}}t}$, where t=1.27ifmmodepmelsetextpmfi{}0.10 and ${d}_{c}$=3.8ifmmodepmelsetextpmfi{}0.2 nm. This agrees well with the theoretical calculations of t for conduction in two-dimensional systems and with our previous work on chromium films." @default.
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- W2030341957 date "1989-05-15" @default.
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- W2030341957 title "Metal-insulator transition in thin nickel films" @default.
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- W2030341957 doi "https://doi.org/10.1103/physrevb.39.9828" @default.
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