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• W2030482851 abstract "A novel plasma-assisted RF magnetron sputtering system with an immersed coil antenna between a target and a substrate was applied for preparing Pb(Zr, Ti)O 3 (PZT) thin films. The antenna enabled the generation of inductively coupled plasma (ICP) independently of the target RF source. The plasma assisted by the antenna resulted in the changes of ion fluxes and these energy distributions irradiating to the substrate. The crystalline phase of the deposited PZT thin films was occupied by the perovskite phase depending on the antenna power. In addition, a high deposition rate, modified uniformity of film thickness, and a dense film structure with large columnar grains were obtained as a result of effects of the assisted plasma. The application of the plasma-assisted sputtering method may enable the preparation of PZT thin films that have excellent properties." @default.
• W2030482851 created "2016-06-24" @default.
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• W2030482851 date "1999-09-01" @default.
• W2030482851 modified "2023-09-25" @default.
• W2030482851 title "Preparation of Pb(Zr, Ti)O₃ Thin Films by Plasma-Assisted Sputtering" @default.
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• W2030482851 doi "https://doi.org/10.1143/jjap.38.5375" @default.
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