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- W2030524931 abstract "In a search for improved resolution and processing latitude for a family of light-sensitive developer-soluble bottom antireflectivecoatings (BARCs), the structure of the binder terpolymer was altered by incorporating acid-cleavableadamantyl methacrylates. Contrast curves and 193-nm microlithography were then used as tools in developing a noveldeveloper-soluble adamantyl BARC which does not include a photoacid generator (PAG) or quencher, but insteaddepends on acid diffusing from the exposed resist for development. This formulation eliminates concern about PAG orquencher leaching out of the BARC during application of the photoresist. Resolution for a resist A and the new BARCwas 150-nm L/S (1:1) for both 38-nm and 54- to 55-nm BARC thicknesses. Resolution and line shape were comparableto that of the non-adamantyl control BARC with same resist at 55-nm BARC thickness, with both BARCs giving someundercutting using an AmphibianTM XIS interferometer for the 193-nm exposures. Light-sensitive adamantyl BARCsthat do require inclusion of a PAG for optimum lithography with resist A are also described in this paper. The series ofdeveloper-soluble adamantyl BARCs were solution and spin-bowl compatible. The 193-nm optical parameters (n andk) for all adamantyl BARCs were 1.7 and 0.5-0.6, respectively." @default.
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- W2030524931 date "2009-03-13" @default.
- W2030524931 modified "2023-09-26" @default.
- W2030524931 title "Improving the performance of light-sensitive developer-soluble anti-reflective coatings by using adamantyl terpolymers" @default.
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- W2030524931 doi "https://doi.org/10.1117/12.813783" @default.
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