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- W2030538082 abstract "The incorporation of a furnace-annealed titanium silicide into a CMOS process is discussed. The titanium silicide is self-aligned to the gate and source/drain areas and the process modules required for this method are shown. This process was used to fabricate CMOS devices and the test results presented show electrical characteristics comparable with those obtained from non-silicided devices. The use of ion beam mixing to improve silicide formation is examined and the resulting device characteristics are presented." @default.
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- W2030538082 date "1989-09-01" @default.
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- W2030538082 title "Characterisation of furnace-annealed TiSi2 for VLSI circuit applications" @default.
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- W2030538082 doi "https://doi.org/10.1016/0169-4332(89)90566-7" @default.
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