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• W2030578230 abstract "Abstract A partially amorphous (the fraction of amorphous volume in the implanted layer was about 0.7) Ni 0.90 B 0.10 alloy formed by 15 K boron implantation into a nickel single crystal was annealed, above the crystallization temperature and post-irradiated at 15 K with low fluences of boron ions. The disordering behaviour was monitored at the different steps of the experiment using Rutherford backscattering and channelling techniques. The results show that, as postulated in a recent model, the simultaneous presence of radiation damage and chemical short-range order is required for amorphization. Annealing has led to the formation of a multiphased alloy in which only the boron-rich crystalline Ni 3 B phase undergoes an amorphous transition by boron post-irradiation." @default.
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• W2030578230 date "1989-08-01" @default.
• W2030578230 modified "2023-10-01" @default.
• W2030578230 title "Detailed analysis of the amorphization process in low-temperature ion-bombarded metallic alloys" @default.
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• W2030578230 doi "https://doi.org/10.1016/0921-5093(89)90667-9" @default.
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