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- W2030710004 endingPage "156" @default.
- W2030710004 startingPage "150" @default.
- W2030710004 abstract "The development of molecularly homogeneous multicomponent oxide based glasses is a key concern in many fields of materials chemistry. Oxide nanoparticles covalently embedded in dielectric matrices represent a class of nanocomposite systems endowed with outstanding optical, mechanical, electronic, and thermal properties. In this study, silica thin films embedding HfO2 were prepared by dip-coating on silica glass via a modified sol-gel processing. This powerful synthetic method, mainly based on the hydrolysis and condensation of metal alkoxides, provides a reliable route to oxide materials which can be processed into a variety of different forms (thin films, powders, monoliths, etc.). The novel synthetic route here presented is based on the copolymerization of the organically modified oxohafnium clusters (Hf4O2(OMc)12 with OMc = OC(O)–C(CH3)=CH2)) with (methacryloxymethyl)triethoxysilane (MAMTES). The crystalline clusters, which are the precursors for the corresponding metal oxide (MO2) were prepared via the sol-gel route by reaction of hafnium butoxide with methacrylic acid. The copolymerization of the cluster with previously prehydrolysed methacrylate-functionalized siloxane, allows the anchoring of the oxocluster to the forming silica network. Thin films were prepared starting from a THF (tetrahydrofurane) solution with molar ratios Hf4O2(OMc)12:MAMTES of 1:44 and a MAMTES:THF molar ratio of 1:5, which was stirred at room temperature for 8 h. After deposition, the film was annealed 3 h at 800 °C in air to promote the decomposition of the hafnium oxocluster to give the corresponding HfO2. The obtained HfO2-SiO2 film resulted transparent and homogeneous. The composition of the film was investigated by secondary ionization mass spectrometry (SIMS) and x-ray photoelectron spectroscopy (XPS), which were used also to investigate the in-depth distribution. The depth profiles evidenced a very homogenous distribution of hafnium within the whole silica film and a sharp film-substrate interface. TEM micrographs revealed the formation of isolated nanocrystalline particles, thus ruling out the formation of a HfO2–SiO2 mixture. Concerning the herewith reported XPS analyses, the main XPS core-levels were analyzed for the sample annealed 3 h at 800 °C. The formation of hafnium oxide was evidenced. Furthermore, a very homogeneous distribution of the guest oxide in the host matrix was evidenced, in agreement with SIMS data." @default.
- W2030710004 created "2016-06-24" @default.
- W2030710004 creator A5000542313 @default.
- W2030710004 creator A5018105924 @default.
- W2030710004 creator A5057674181 @default.
- W2030710004 creator A5067999085 @default.
- W2030710004 date "2003-12-01" @default.
- W2030710004 modified "2023-09-26" @default.
- W2030710004 title "HfO2-doped Silica Thin Films by XPS" @default.
- W2030710004 cites W185443284 @default.
- W2030710004 cites W2006072415 @default.
- W2030710004 cites W2073167526 @default.
- W2030710004 cites W2082071341 @default.
- W2030710004 cites W2092929495 @default.
- W2030710004 doi "https://doi.org/10.1116/11.20040403" @default.
- W2030710004 hasPublicationYear "2003" @default.
- W2030710004 type Work @default.
- W2030710004 sameAs 2030710004 @default.
- W2030710004 citedByCount "4" @default.
- W2030710004 crossrefType "journal-article" @default.
- W2030710004 hasAuthorship W2030710004A5000542313 @default.
- W2030710004 hasAuthorship W2030710004A5018105924 @default.
- W2030710004 hasAuthorship W2030710004A5057674181 @default.
- W2030710004 hasAuthorship W2030710004A5067999085 @default.
- W2030710004 hasConcept C127413603 @default.
- W2030710004 hasConcept C159985019 @default.
- W2030710004 hasConcept C160434732 @default.
- W2030710004 hasConcept C171250308 @default.
- W2030710004 hasConcept C175708663 @default.
- W2030710004 hasConcept C178790620 @default.
- W2030710004 hasConcept C185592680 @default.
- W2030710004 hasConcept C188027245 @default.
- W2030710004 hasConcept C19067145 @default.
- W2030710004 hasConcept C191897082 @default.
- W2030710004 hasConcept C192562407 @default.
- W2030710004 hasConcept C2776139660 @default.
- W2030710004 hasConcept C2777691222 @default.
- W2030710004 hasConcept C2779851234 @default.
- W2030710004 hasConcept C38398224 @default.
- W2030710004 hasConcept C42360764 @default.
- W2030710004 hasConcept C521977710 @default.
- W2030710004 hasConcept C92880739 @default.
- W2030710004 hasConceptScore W2030710004C127413603 @default.
- W2030710004 hasConceptScore W2030710004C159985019 @default.
- W2030710004 hasConceptScore W2030710004C160434732 @default.
- W2030710004 hasConceptScore W2030710004C171250308 @default.
- W2030710004 hasConceptScore W2030710004C175708663 @default.
- W2030710004 hasConceptScore W2030710004C178790620 @default.
- W2030710004 hasConceptScore W2030710004C185592680 @default.
- W2030710004 hasConceptScore W2030710004C188027245 @default.
- W2030710004 hasConceptScore W2030710004C19067145 @default.
- W2030710004 hasConceptScore W2030710004C191897082 @default.
- W2030710004 hasConceptScore W2030710004C192562407 @default.
- W2030710004 hasConceptScore W2030710004C2776139660 @default.
- W2030710004 hasConceptScore W2030710004C2777691222 @default.
- W2030710004 hasConceptScore W2030710004C2779851234 @default.
- W2030710004 hasConceptScore W2030710004C38398224 @default.
- W2030710004 hasConceptScore W2030710004C42360764 @default.
- W2030710004 hasConceptScore W2030710004C521977710 @default.
- W2030710004 hasConceptScore W2030710004C92880739 @default.
- W2030710004 hasIssue "1" @default.
- W2030710004 hasLocation W20307100041 @default.
- W2030710004 hasOpenAccess W2030710004 @default.
- W2030710004 hasPrimaryLocation W20307100041 @default.
- W2030710004 hasRelatedWork W122766979 @default.
- W2030710004 hasRelatedWork W2020946050 @default.
- W2030710004 hasRelatedWork W2326444642 @default.
- W2030710004 hasRelatedWork W2331346999 @default.
- W2030710004 hasRelatedWork W2333818907 @default.
- W2030710004 hasRelatedWork W2782105711 @default.
- W2030710004 hasRelatedWork W3092497601 @default.
- W2030710004 hasRelatedWork W3092945548 @default.
- W2030710004 hasRelatedWork W4254879758 @default.
- W2030710004 hasRelatedWork W638254716 @default.
- W2030710004 hasVolume "10" @default.
- W2030710004 isParatext "false" @default.
- W2030710004 isRetracted "false" @default.
- W2030710004 magId "2030710004" @default.
- W2030710004 workType "article" @default.