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• W2030718547 abstract "Synchrotron-based high-resolution photoemission has been used to study the interaction of thiophene, pyridine, and cyclohexylamine (CHA) with pure and Ni-promoted MoSx films and S/Mo(110) surfaces. The MoSx films exhibit Mo 3d and valence spectra that are very similar to those of MoS2. On the MoSx systems, the behavior of thiophene closely resembles that seen on MoS2(0002). The molecules are weakly chemisorbed, and most of them desorb at temperatures around 200 K. A small fraction of the adsorbed thiophene is bonded to Mo sites that have S vacancies and desorbs between 250 and 300 K. A similar behavior is observed for adsorbed pyridine. In contrast, CHA displays a rich chemistry on these surfaces. Mo centers that have a limited number of S vacancies and do not do chemistry with thiophene, pyridine, or H2 are able to cleave the C−N bond in a nonaromatic H-rich molecule like CHA. The addition of Ni enhances the chemical activity of MoSx. On the NiMoSx systems, the adsorption energies of thiophene and pyridi..." @default.
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• W2030718547 date "1999-09-01" @default.
• W2030718547 modified "2023-10-18" @default.
• W2030718547 title "Chemistry of Thiophene, Pyridine, and Cyclohexylamine on Ni/MoSxand Ni/S/Mo(110) Surfaces: Role of Nickel in Hydrodesulfurization and Hydrodenitrogenation Processes" @default.
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• W2030718547 doi "https://doi.org/10.1021/jp991683b" @default.
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